发明名称 PELLICLE FRAME, PELLICLE, FRAME MEMBER, EXPOSURE ORIGINAL PLATE, EXPOSURE DEVICE, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE
摘要 A pellicle frame (300) equipped with a first frame member (100) and a second frame member (200) arranged such that one end face of each frame member in the thickness direction opposes an end face of the other frame member. In addition, at least one of the opposing end faces in the pellicle frame (300) is equipped with a groove-shaped recess part (112), which communicates with outer peripheral faces (30, 130) and inner peripheral faces (40, 140) of the pellicle frame, and has one or more bend sections or branching sections within the end face, and at least one of the end faces (10, 20, 110) of the first frame member and/or the second frame member is equipped with a groove (12, 22) having through-holes (14A, 14B, 24A, 24B) which are not connected to the recess part (112) but communicate with the outer peripheral faces (30, 130). Thus, the workability of a through flow passage is improved.
申请公布号 WO2015174412(A1) 申请公布日期 2015.11.19
申请号 WO2015JP63633 申请日期 2015.05.12
申请人 MITSUI CHEMICALS, INC. 发明人 KOHMURA, KAZUO;ONO, YOSUKE;TANEICHI, DAIKI;SATO, YASUYUKI;HIROTA, TOSHIAKI
分类号 G03F1/64 主分类号 G03F1/64
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