| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for manufacturing a substrate with a mask for a lift-off process, by which a concavo-convex structure is prevented from collapsing without decreasing convenience and high throughput property, burrs at an end are less likely produced, and a favorable concavo-convex pattern can be formed.SOLUTION: A substrate 10 with a mask for a lift-off process is obtained in the following way. A laminate 1 including a first resist layer 12 and a second resist layer 13 functioning as a mask, formed by a nano-imprinting process on a major surface 11a of a substrate 11 is treated with a developer that dissolves the first resist layer. The first resist layer is etched by using the second resist layer as a mask to form a mask layer 15 that is composed of the first resist layer and the second resist layer and constituting a concavo-convex structure 14 in which at least a part of the major surface is exposed. The structure is formed into a constricted shape in a cross-sectional view in a direction substantially perpendicular to the major surface of the first resist layer. |
