Extreme Ultraviolet Light (EUV) Photomasks and Fabrication Methods Thereof

摘要

Embodiments of EUV photomasks and methods for forming a EUV photomask are provided. The method comprises providing a substrate, a reflective layer, a capping layer, a hard mask layer, and forming an opening therein. An absorber layer is then filled in the opening and over the top surface of the hard mask layer. A removing process is provided to form an absorber with a top surface lower than a top surface of the capping layer.

主权项

1. A method of fabricating an extreme ultraviolet photomask, comprising:
forming on a substrate a reflective coating; forming over the reflective coating a capping layer; patterning the capping layer and the reflective coating to form an opening therein; at least partially filling the opening with an absorber layer, the absorber layer having a top surface; and recessing the top surface of the absorber layer to be at a level below a top surface of the capping layer.