发明名称 HIGH PERFORMANCE TOPOLOGICAL INSULATOR TRANSISTORS
摘要 Topological insulators, such as single-crystal Bi2Se3 nanowires, can be used as the conduction channel in high-performance transistors, a basic circuit building block. Such transistors exhibit current-voltage characteristics superior to semiconductor nanowire transistors, including sharp turn-on, nearly zero cutoff current, very large On/Off current ratio, and well-saturated output current. The metallic electron transport at the surface with good effective mobility can be effectively separated from the conduction of the bulk topological insulator and adjusted by field effect at a small gate voltage. Topological insulators, such as Bi2Se3, also have a magneto-electric effect that causes transistor threshold voltage shifts with external magnetic field. These properties are desirable for numerous microelectronic and nanoelectronic circuitry applications, among other applications.
申请公布号 US2015333163(A1) 申请公布日期 2015.11.19
申请号 US201314652017 申请日期 2013.12.12
申请人 QILIANG Li;RICHTER Curt A.;ZHU Hao 发明人 Qiliang Li;Richter Curt A.;Zhu Hao
分类号 H01L29/775 主分类号 H01L29/775
代理机构 代理人
主权项 1. A transistor comprising: a source; a drain; a conduction channel comprising a topological insulator material nanowire between the source and the drain; and a first gate over the topological insulator material.
地址 Fairfax VA US