LIGHTING METHOD AND MICROSCOPIC OBSERVATION DEVICE

摘要

Standing wave-generating planar wave illumination units 40 and 50 serve to generate two light-wave planar waves 41 and 51 using light from a light source assembly 30 and irradiate a sample surface 23 with a standing wave produced by interference of the generated two light-wave planar waves 41 and 51 on the sample surface 23. Additionally, a bias planar wave illumination unit 60 serves to generate a bias planar wave 61 using the light from the light source assembly 30 and irradiate the sample surface 23 with the bias planar wave 61. The bias planar wave 61 is synchronized with the standing wave to alternately oscillate to positive and to negative with an equal electric field displacement irrespective of the position on the sample surface 23 across a reference time specified in advance as a time when an electric field displacement of the standing wave has a value "0" at the respective positions on the sample surface 23, and oscillates at a bias amplitude (amplitude of a value 2A equal to the amplitude of the standing wave) specified in advance as an amplitude to raise the electric field displacement of the standing wave on the sample surface 23 just to only a positive displacement or to only a negative displacement.