| 摘要 |
The present invention relates to a chemically amplified negative resist composition having a mechanism for performing cross-linking between resist polymers and insolubilizing an alkaline developing solution, by a crosslinking agent and/or a repeating unit having a crosslinkable functional group among resist polymers while having an acid generated by irradiation with high energy beams as a catalyst. The resist polymers contain repeating units of chemical formulas (1) to (4), and a repeating unit represented by chemical formula (1) includes 0.5 to 10 mole%. In addition, a ratio of the total amount of repeating units represented by chemical formulas (2) to (4) includes 50 to 99.5 mole%. According to the present invention, fine distribution and diffusion of a compound having an ability of generating an acid in a resist film can be more uniform, and effective sensitivity can be advantageously obtained. In addition, line edge roughness can be improved; deactivation of an acid on a substrate interface can be suppressed; and a resist profile with a small undercut degree specific to a negative resist composition can be formed. |
