Maskless vortex phase shift optical direct write lithography

摘要

The present invention provides methods and apparatus for accomplishing optical direct write phase shift lithography. A lithography system and method are provided wherein a mirror array is configured to generate vortex phase shift optical patterns that are directed onto a photosensitive layer of a substrate. The lithography methods and systems facilitate pattern transfer using such vortex phase shift exposure patterns.

主权项

1. A maskless lithography system for patterning a substrate having a layer of photoimageable material formed thereon, the system comprising:
a mirror array comprising a plurality of movable mirrors arranged in a plurality of tiles configured in vortex phase shift optical patterns enabling the generation of corresponding vortex phase shift exposure patterns; an illumination source arranged to direct light onto the mirror array to generate the respective vortex phase shift exposure patterns; optics configured to project the vortex phase shift exposure patterns onto a substrate; and a stage for holding the substrate to facilitate exposure of at least a portion of the substrate to the vortex phase shift optical patterns.