| 摘要 |
PROBLEM TO BE SOLVED: To provide a photosensitive resin composition that is excellent in sensitivity, resolution and exposure margin of the photosensitive resin composition.SOLUTION: A photosensitive resin composition contains (A') a polymer containing (a1) a protected hydroxystyrene monomer unit, (A'') a polymer containing (a2) a hydroxystyrene monomer unit, (B) a photoacid generator including an oxime sulfonate structure represented by formula (b1), (C) a compound represented by formula (I), and (D) solvent. |
