发明名称 SURFACE TREATMENT SUBSTRATE
摘要 PROBLEM TO BE SOLVED: To provide a surface treatment substrate capable of suppressing effectively decline of solder wettability generated in the case of long-term storage, by suppressing formation of an oxide film.SOLUTION: A surface treatment substrate has successively from the substrate side on the surface of the substrate, a nickel plating layer containing sulfur atoms as much as 0.01-0.13 wt%, and a treatment film comprising a treatment agent having a hydrophobic group and a hydrophilic group.
申请公布号 JP2015203123(A) 申请公布日期 2015.11.16
申请号 JP20140081648 申请日期 2014.04.11
申请人 TOYO KOHAN CO LTD 发明人 TSUDA TOSHIYA;ISHIHARA KAZUHIKO;ICHIJIMA SHINJI
分类号 C23C28/00;B32B15/08;C09K3/18;C25D5/48 主分类号 C23C28/00
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