发明名称 SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a technique for suppressing thermally caused metal diffusion.SOLUTION: A semiconductor device includes: a semiconductor layer formed of a semiconductor; a first electrode layer Schottky-bonded to the semiconductor layer at at least a part thereof; a second electrode layer formed on the first electrode layer and suppressing metal diffusion; and a third electrode layer formed on the second electrode layer and used for wiring. The second electrode layer includes a molybdenum layer mainly formed of molybdenum and a vanadium layer mainly formed of vanadium.
申请公布号 JP2015204333(A) 申请公布日期 2015.11.16
申请号 JP20140082148 申请日期 2014.04.11
申请人 TOYODA GOSEI CO LTD 发明人 TANAKA SHIGEAKI;HASEGAWA KAZUYA;OKA TORU
分类号 H01L29/872;H01L21/28;H01L21/329;H01L21/338;H01L29/47;H01L29/812 主分类号 H01L29/872
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