发明名称 |
SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE |
摘要 |
PROBLEM TO BE SOLVED: To provide a technique for suppressing thermally caused metal diffusion.SOLUTION: A semiconductor device includes: a semiconductor layer formed of a semiconductor; a first electrode layer Schottky-bonded to the semiconductor layer at at least a part thereof; a second electrode layer formed on the first electrode layer and suppressing metal diffusion; and a third electrode layer formed on the second electrode layer and used for wiring. The second electrode layer includes a molybdenum layer mainly formed of molybdenum and a vanadium layer mainly formed of vanadium. |
申请公布号 |
JP2015204333(A) |
申请公布日期 |
2015.11.16 |
申请号 |
JP20140082148 |
申请日期 |
2014.04.11 |
申请人 |
TOYODA GOSEI CO LTD |
发明人 |
TANAKA SHIGEAKI;HASEGAWA KAZUYA;OKA TORU |
分类号 |
H01L29/872;H01L21/28;H01L21/329;H01L21/338;H01L29/47;H01L29/812 |
主分类号 |
H01L29/872 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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