发明名称 有机电晶体、化合物、非发光性有机半导体装置用有机半导体材料、有机电晶体用材料、非发光性有机半导体装置用涂布液、有机电晶体的制造方法、有机半导体薄膜的制造方法、非发光性有机半导体装置用有机半导体薄膜、有机半导体材料的合成方法;ORGANIC TRANSISTOR, COMPOUND, ORGANIC SEMICONDUCTOR MATERIAL FOR NONLUMINESCENCE ORGANIC SEMICONDUCTOR DEVICE, MATERIAL FOR ORGANIC TRANSISTOR, COATING SOLUTION FOR NONLUMINESCENCE ORGANIC SEMICONDUCTOR DEVICE, METHOD FOR MANUFACTURING ORGANIC TRANSISTOR, METHOD FOR MANUFACTURING ORGANIC SEMICONDUCTOR FILM, ORGANIC SEMICONDUCTOR FILM FOR NONLUMINESCENCE ORGANIC SEMICONDUCTOR DEVICE AND METHOD FOR SYNTHESIZING ORGANIC SEMICONDUCTOR MATERIAL
摘要 本发明提供载流子迁移率高的有机电晶体、化合物、非发光性有机半导体装置用有机半导体材料、有机电晶体用材料、非发光性有机半导体装置用涂布液、有机电晶体的制造方法、有机半导体薄膜的制造方法、非发光性有机半导体装置用有机半导体薄膜、有机半导体材料的合成方法。一种有机电晶体,其具有半导体有源层,该半导体有源层含有由下式表示且分子量为3000以下的化合物(X为氧、硫、硒、碲原子或NR 5 ;Y和Z为CR 6 、氧、硫、硒、氮原子或NR 7 ;含有Y和Z的环为芳香族杂环;R 1 和R 2 中的任意一个与含有Y和Z的芳香族杂环、或者、R 3 和R 4 中的任意一个与苯环可以经由特定的二价连接基团而键合;R 1 、R 2 、R 5 ~R 8 为氢原子、烷基、烯基、炔基、芳基或杂芳基;R 3 和R 4 为烷基、烯基、炔基、芳基或杂芳基;m和n为0~2的整数)。;The invention provides organic transistor, compound, organic semiconductor material for nonluminescence organic semiconductor device, material for organic transistor, coating solution for nonluminescence organic semiconductor device, method for manufacturing organic transistor, method for manufacturing organic semiconductor film, organic semiconductor film for nonluminescence organic semiconductor device and method for synthesizing organic semiconductor material of which has high carrier mobility. An organic transistor comprises semiconductor active layer that shown as the formula below of which has compounds that the molecular mass thereof is below 3000(X represents O2, S, Se, Te atom or NR 5 ; Y and Z represent CR6, O2, S, Se, N atom or NR 7 ; the ring comprising Y and Z is aromatic heterocyclic ring; either R 1 or R 2 bonding with the aromatic heterocyclic ring that comprised Y and Z by specific divalent connecting group or either R 3 or R 4 can bond with the benzene ring by specific divalent connecting group; R 1 、R 2 、R 5 ~R 8 are H atom, alkyl radical, alkenyl group, alkinyl group, aryl group or heterocyclic aryl; R 3 and R 4 are alkyl radical, alkenyl group, alkinyl group, aryl group or heterocyclic aryl; m and n are integers between 0~2).
申请公布号 TW201542566 申请公布日期 2015.11.16
申请号 TW104109931 申请日期 2015.03.26
申请人 富士软片股份有限公司 FUJIFILM CORPORATION 发明人 津山博昭 TSUYAMA, HIROAKI;野村公笃 NOMURA, KIMIATSU;宇佐美由久 USAMI, YOSHIHISA;福崎英治 FUKUZAKI, EIJI;小柳雅史 KOYANAGI, MASASHI;北村哲 KITAMURA, TETSU;渡边哲也 WATANABE, TETSUYA;冈本敏宏 OKAMOTO, TOSHIHIRO;竹谷纯一 TAKEYA, JUNICHI
分类号 C07D495/14(2006.01);C07D517/14(2006.01);H01L51/46(2006.01);H01L51/30(2006.01) 主分类号 C07D495/14(2006.01)
代理机构 代理人 陈丰裕
主权项
地址 日本 JP;