发明名称 DIRECTIONAL TREATMENT FOR MULTI-DIMENSIONAL DEVICE PROCESSING
摘要 Embodiments of the disclosure include apparatus and methods for modifying a surface of a substrate using a surface modification process. The process of modifying a surface of a substrate generally includes the alteration of a physical or chemical property and/or redistribution of a portion of an exposed material on the surface of the substrate by use of one or more energetic particle beams while the substrate is disposed within a particle beam modification apparatus. Embodiments of the disclosure also provide a surface modification process that includes one or more pre-modification processing steps and/or one or more post-modification processing steps that are all performed within one processing system.
申请公布号 US2015325411(A1) 申请公布日期 2015.11.12
申请号 US201514703922 申请日期 2015.05.05
申请人 Applied Materials, Inc. 发明人 GODET Ludovic;DAI Huixiong;NEMANI Srinivas D.;YIEH Ellie Y.;INGLE Nitin Krishnarao
分类号 H01J37/32 主分类号 H01J37/32
代理机构 代理人
主权项 1. An apparatus for modifying a surface of a substrate, comprising: a substrate support having a substrate supporting surface; a first particle beam source assembly configured to generate a first particle beam that is directed in a first direction, wherein the first particle beam is directed towards the substrate supporting surface and the first direction is at a first grazing angle relative to a second direction that is normal to the substrate supporting surface; and an actuator that is configured to translate the substrate supporting surface relative to the first particle beam in a third direction, wherein the third direction is at an angle to a plane that contains the first direction.
地址 Santa Clara CA US