发明名称 INTEGRATED THIN FILM RESISTOR AND MIM CAPACITOR
摘要 In described examples, an electronic device includes a semiconductor structure (102) having a back end capacitor (122) and a back end thin film resistor (126). The semiconductor structure (102) includes a first dielectric layer (106), a bottom plate (134) of the capacitor (122) and a thin film resistor body (132). The bottom plate (134) and the resistor body (132) are laterally spaced apart portions of the same thin film layer (108). The bottom plate (134) further includes a conductive layer (110) overlying the thin film layer (108). A second dielectric layer (124) is disposed on the conductive layer (110) of the bottom plate (134) of the capacitor (122). A top plate (120) of the capacitor (122) is disposed on the second dielectric layer (124).
申请公布号 WO2015171659(A1) 申请公布日期 2015.11.12
申请号 WO2015US29317 申请日期 2015.05.05
申请人 TEXAS INSTRUMENTS INCORPORATED;TEXAS INSTRUMENTS DEUTSCHLAND GMBH;TEXAS INSTRUMENTS JAPAN LIMITED 发明人 DIRNECKER, CHRISTOPH
分类号 H01L27/102 主分类号 H01L27/102
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