| 摘要 |
PROBLEM TO BE SOLVED: To provide a polishing particle and a polishing material satisfactory in both of polishing velocity and the smoothness of the polished face.SOLUTION: Provided is a tabular particle characterized in that, measured by an image analysis method, the average major axis (D) is 200 to 400 nm, the average miner axis (S) is 70 to 300 nm, the average thickness (H) lies in the range of 20 to 100 nm, the value in a ratio between the average major axis (D) and the average thickness (H), (D)/(S) lies in the range of 1.2 to 10, an XRD pattern being amorphous, and the molar ratio composition thereof is expressed by AlO:NaO:SiO=100:1 to 200 to 25,000. |
