发明名称 CRYSTALLINE MULTILAYER STRUCTURE AND SEMICONDUCTOR DEVICE
摘要 Provided is a crystalline multilayer structure having good semiconductor properties. In particular, the crystalline multilayer structure has good electrical properties as follows: the controllability of conductivity is good; and vertical conduction is possible. A crystalline multilayer structure includes a metal layer containing a uniaxially oriented metal as a major component and a semiconductor layer disposed directly on the metal layer or with another layer therebetween and containing a crystalline oxide semiconductor as a major component. The crystalline oxide semiconductor contains one or more metals selected from gallium, indium, and aluminum and is uniaxially oriented.
申请公布号 US2015325660(A1) 申请公布日期 2015.11.12
申请号 US201414578072 申请日期 2014.12.19
申请人 FLOSFIA INC. 发明人 Hitora Toshimi;Oda Masaya;Takatsuka Akio
分类号 H01L29/22;H01L33/28;H01L29/04 主分类号 H01L29/22
代理机构 代理人
主权项 1. A crystalline multilayer structure comprising: a metal layer containing a uniaxially oriented metal as a major component; and a semiconductor layer disposed directly on the metal layer or with another layer therebetween and containing a crystalline oxide semiconductor as a major component, wherein the crystalline oxide semiconductor contains one or more metals selected from gallium, indium, and aluminum and is uniaxially oriented.
地址 Kyoto-shi JP