| 摘要 |
PROBLEM TO BE SOLVED: To provide a detection device capable of accurately verifying a processing state by processing a work-piece.SOLUTION: An unevenness detection device 7 includes: a pulse lightening light source 72 for emitting light having a predetermined wavelength band; a first convergent lens 73; a half mirror 74; a chromatic aberration lens 75 for radiating branched light to a work-piece W held by work-piece holding means 36; a first condenser lens 76 for condensing returned light reflected by the work-piece; a mask 77; a second convergent lens 78; a diffraction grating 79; a second condenser lens 80; an imaging element 81; control means comprising a memory for storing an image generated by the imaging element; and output means for displaying the image. When a width direction of a detection area for detecting unevenness of the work-piece is set to the Y axis direction, and the longitudinal direction is set to the x axis direction, the mask is formed with a slit extending to the Y axis direction. The imaging element generates a two-dimensional cross section in the Y axis direction on the basis of the returned light having passed the slit formed in the mask. |
