MONOMER, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS

摘要

A polymer for resist use is obtainable from a monomer having formula (1) wherein R1 is H, CH3 or CF3, R2 and R3 each are H or a monovalent hydrocarbon group, X1 is a divalent hydrocarbon group, k1=0 or 1, and Z forms a 5 or 6-membered alicyclic ring. A resist composition comprising the polymer is shelf stable and displays a high dissolution contrast, controlled acid diffusion and low roughness during both alkaline development and organic solvent development.;

主权项

1. A monomer having the general formula (1): wherein R1 is hydrogen, methyl or trifluoromethyl, R2 and R3 are each independently hydrogen or a straight, branched or cyclic, monovalent hydrocarbon group of 1 to 10 carbon atoms, R2 and R3 may bond together to form an alicyclic group of 5 to 10 carbon atoms, which may be separated by an oxygen atom or have a carbon chain, with the carbon atom to which they are attached, X1 is a straight, branched or cyclic, divalent hydrocarbon group of 1 to 20 carbon atoms in which a constituent —CH2— may be replaced by —O— or —C(═O)—, k1 is 0 or 1, and Z forms a 5 or 6-membered alicyclic group, which may contain a heteroatom, with the two carbon atoms to which it is attached.