SPUTTERING TARGET MATERIAL

摘要

The present invention provides a sputtering target material which is suitable for the formation of a blackened layer of a sensor film for capacitive touch panels, and which can be discharged by means of a direct-current power supply. The present invention relates to a sputtering target material which is characterized by having: a mixed structure of a copper-based metal phase and an oxide phase; an oxygen content of from 5% by atom to 30% by atom; a relative density of 85% or more; and a bulk resistivity of 1.0 × 10-2 Ωcm or less. It is preferable that the copper-based metal phase has an average particle diameter of from 0.5 μm to 10.0 μm and the oxide phase has an average particle diameter of from 0.05 μm to 7.0 μm.