| 摘要 |
PROBLEM TO BE SOLVED: To provide a plasma CVD film-forming device that prevents the occurrence of an abnormal discharge in a section where a substrate is not wound in a range in which a film is formed in an axial direction of a film-forming roller.SOLUTION: A plasma CVD film-forming device 10 includes: a vacuum chamber 1; a metal film-forming roller 2 which has a belt-like substrate wound around a part of the overall periphery of the film-forming roller 2; a magnetic field generation part 3 which is arranged in the film-forming roller 2, and generates a magnetic field outside the part of the film-forming roller 2, around which the substrate is wound; a power source 4 which is connected to the film-forming roller 2, and applies, to the film-forming roller 2, an AC voltage for generating plasma in a region of the magnetic field; and a cover 9 which covers a part 2a of the film-forming roller 2, is not in contact with the substrate A, and located opposite side to the part 2A around which the substrate A is wound, with a rotation axis of the film-forming roller 2 interposed therebetween. |
