| 摘要 |
Systems and methods for processing a substrate comprise an exposure of a substrate to UV light from a UV light source having a predetermined wavelength range. The substrate includes a photoresist layer which has received ion bombardment. The method includes a step of controlling a temperature of the substrate to a temperature less than or equal to a first temperature, while exposing the substrate to the UV light. The method includes a step of removing the photoresist layer by using plasma, while maintaining a temperature of the substrate to less than or equal to a strip process temperature, after a step of exposing the substrate to the UV light. |
