BEAM PATH MONITORING DEVICE, AND BEAM PATH MONITORING SYSTEM

摘要

An optical line monitoring apparatus and optical line monitoring system which can measure a reflectance distribution in an optical line with a high spatial resolution in a short time are provided. An optical line monitoring apparatus 14A provided in a station 10A comprises an OCDR measurement section 15 for carrying out OCDR measurement, an OTDR measurement section 16 for carrying out OTDR measurement, an optical switch 13 for selectively connecting one of the OCDR measurement section 15 and OTDR measurement section 16 to the optical coupler 12, a control section 17, and a storage device 18. The control section 17 performs a predetermined arithmetic operation according to an OCDR measurement result acquired by causing the OCDR measurement section 15 to carry out the OCDR measurement and an OTDR measurement result acquired by causing the OTDR measurement section 16 to carry out the OTDR measurement.