发明名称 半導体装置の作製方法
摘要 <p>A liquid crystal display device is provided with high productivity at low cost by reducing manufacturing steps of the liquid crystal display device. A liquid crystal display device with less power consumption and high reliability is provided. Etching of a semiconductor layer and formation of a contact hole that connects a pixel electrode and a drain electrode are performed by one photolithography process and one etching step, whereby the number of photolithography processes is reduced. A liquid crystal display device can be provided with high productivity at low cost by reducing the number of photolithography processes. Further, an oxide semiconductor is used for the semiconductor layer, whereby a liquid crystal display device with less power consumption and high reliability can be provided.</p>
申请公布号 JP5806043(B2) 申请公布日期 2015.11.10
申请号 JP20110181935 申请日期 2011.08.23
申请人 发明人
分类号 G02F1/1368;H01L21/336;H01L21/36;H01L29/786 主分类号 G02F1/1368
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