| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a method of manufacturing a drawing object which allows for equalization of the drawing line width while extending the drawing distance when compared with prior art by minimizing decrease in sharpness at the tip of the pointed part of a drawing member, and to provide a drawing member in which decrease in sharpness is minimized, and a drawing device including the drawing member. <P>SOLUTION: A substrate K having a coat containing a fluorine-containing compound and formed on an electron beam resist is subjected to drawing processing by using a drawing device 1 including a base 2 on which the substrate K is mounted, a base moving mechanism 3 for moving the base 2, a drawing member 10 having a pointed part on which a gold layer as an inner layer and a platinum layer as an outer layer are formed, a support member 4 for supporting the drawing member 10, a drawing member moving mechanism 5 for moving the drawing member 10 via the support member 4, and a voltage application mechanism 6 for applying a voltage to the substrate K and the drawing member 10. <P>COPYRIGHT: (C)2013,JPO&INPIT</p> |
