发明名称 PHOTOCURABLE MONOMER COMPOUND AND METHOD FOR PRODUCING THEREOF
摘要 According to an aspect of the present invention, a photocurable monomer compound has a reflective index higher than a reflective index of a photocurable monomer compound produced by using 1,4-CHDM in a symmetric chemical structure, exists in a liquid phase at room temperature, and thus can be used conveniently. In addition, the photocurable monomer compound according to an aspect of the present invention has a high refractive index and thus can reduce a rainbow effect of a cured coating film. Furthermore, the photocurable monomer compound according to an aspect of the present invention can have a high refractive index and thus can be advantageously used for a photocurable resin composition applied to a material for an optical component. The photocurable monomer compound can be used as a material for coating the surface of a plastic film substrate or can be used to provide high transparency, a high refractive index, and high surface hardness, excellent productivity, and excellent heat resistance to an optical product.
申请公布号 KR101567719(B1) 申请公布日期 2015.11.10
申请号 KR20140102366 申请日期 2014.08.08
申请人 GENENCHIP 发明人 BAE, JIN YOUNG;KIM, JOO SUNG
分类号 C07C69/587;C07C67/08;C08F20/18;C08G63/47 主分类号 C07C69/587
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