发明名称 層構造を利用する改善されたデバイススイッチング
摘要 A resistive switching device. The device includes a first electrode comprising a first metal material overlying the first dielectric material and a switching material comprising an amorphous silicon material. The device includes a second electrode comprising at least a second metal material. In a specific embodiment, the device includes a buffer material disposed between the first electrode and the switching material. The buffer material provides a blocking region between the switching material and the first electrode so that the blocking region is substantially free from metal particles from the second metal material when a first voltage is applied to the second electrode.
申请公布号 JP5808811(B2) 申请公布日期 2015.11.10
申请号 JP20130525926 申请日期 2011.07.29
申请人 クロスバー, インコーポレイテッドCrossbar, Inc. 发明人 ジョー, サン ヒョン;ルー, ウェイ
分类号 H01L27/105;H01L45/00;H01L49/00 主分类号 H01L27/105
代理机构 代理人
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