| 摘要 |
Provided are a phase inversion blank mask and a photomask. The phase inversion blank comprises a phase inversion membrane and a light shielding membrane on a transparent substrate. The light shielding membrane consists of one among a multilayered membrane with two or more layers and a continuous membrane, containing two or more among a metal, oxygen (O), nitrogen (N), and carbon (C). The uppermost layer of the light shielding membrane requisitely contains carbon (C), and at least one between the oxygen (O) and the nitrogen (N) included in the light shielding membrane is much more contained in a lower layer than an upper layer. When carbon (C) is contained in the entire light shielding membrane, the carbon (C) contained in the light shielding membrane is less in the lower layer compared to the upper layer. |
