发明名称 RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING RESIST PATTERN
摘要 PROBLEM TO BE SOLVED: To provide a radiation-sensitive resin composition excellent in storage stability, LWR performance, CDU performance, EL performance and development defect inhibition property.SOLUTION: The radiation-sensitive resin composition comprises a first polymer having a structural unit including an acid-dissociable group, a radiation-sensitive acid generator, an acid diffusion inhibitor represented by formula (1), and a solvent. In formula (1), Rto Reach independently represent a hydrogen atom or a 1-20C monovalent organic group, or two or more among R, one of or a plurality of Rto R, and Rand R, are coupled to form a 3- to 20-membered cyclic structure together with a carbon atom to which these groups are bonded; X represents an oxygen atom or a sulfur atom; and n and m represent an integer of 0 to 5, where either n or m is 0.
申请公布号 JP2015197546(A) 申请公布日期 2015.11.09
申请号 JP20140074854 申请日期 2014.03.31
申请人 JSR CORP 发明人 NAMAI HAYATO;ANNO YUSUKE
分类号 G03F7/039;C08K5/3412;C08L33/06;G03F7/004;G03F7/038;H01L21/027 主分类号 G03F7/039
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