METHOD FOR FORMING MICRO PATTERN ON GLASS BY ETCHING

摘要

The present invention relates to a glass etching method for forming fine patterns. The glass etching method comprises the following steps of: spin-coating a positive sensitizing solution on glass; heating the glass; positioning a photomask film on which fine patterns are printed on the glass; radiating ultrasonic rays to the photomask film; removing the photomask film and dipping the glass into a developing solution; heating the glass; etching the part on which the fine patterns are formed by dipping the glass into a bath filled with a solution wherein 50 wt% of an ammonium fluoride solution and 2 wt% of hydrogen fluoride solution are mixed; removing the sensitizing solution on the glass using a cleaning solution; and cleaning the glass using the cleaning solution. According to the configuration, the present invention can provide the glass etching method capable of precisely etching the fine patterns to have surface roughness of the etched surface by optimizing a concentration rate of the etching solution for etching the glass and an inner temperature of the bath.