VAPOR DEPOSITION APPARATUS

摘要

A vapor deposition apparatus according to the embodiment of the present invention includes; a chamber where a substrate is arranged; a temperature control part which controls the process temperature of the chamber; an organic deposition part which deposits an organic layer on the substrate or an inorganic layer; and an inorganic layer deposition part which deposits the inorganic layer on the organic layer or the substrate; and a pressure control part which is connected to the chamber and controls a process pressure in the chamber. The organic layer and the inorganic layer form a multiple composite organic/inorganic layer without a change in a vacuum state and a movement of a deposition material in the chamber.