ETCHING SOLUTION, METHOD FOR ETCHING IN WHICH SAME IS USED, METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE PRODUCT, METAL CORROSION INHIBITOR, AND METAL CORROSION-INHIBITING COMPOSITION

摘要

A semiconductor processor etching solution, wherein the etching solution has a plurality of adsorbing groups and contains a compound P (P1) that has a weight-average molecular weight of 1,000 or greater, or the etching solution has a plurality of adsorbing groups and contains a compound P (P2) that has a steric repulsion part.