发明名称 GAS CUSHION APPARATUS AND TECHNIQUES FOR SUBSTRATE COATING
摘要 A coating can be provided on a substrate. Fabrication of the coating can include forming a solid layer in a specified region of the substrate while supporting the substrate in a coating system using a gas cushion. For example, a liquid coating can be printed over the specified region while the substrate is supported by the gas cushion. The substrate can be held for a specified duration after the printing the patterned liquid. The substrate can be conveyed to a treatment zone while supported using the gas cushion. The liquid coating can be treated to provide the solid layer including continuing to support the substrate using the gas cushion.
申请公布号 WO2015168036(A1) 申请公布日期 2015.11.05
申请号 WO2015US27835 申请日期 2015.04.27
申请人 KATEEVA, INC. 发明人 KO, ALEXANDER SOU-KANG;MAUCK, JUSTIN;VRONSKY, ELIYAHU;MADIGAN, CONOR F.;RABINOVICH, EUGENE;HARJEE, NAHID;BUCHNER, CHRISTOPHER;LEWIS, GREGORY
分类号 H01L21/67;H01L21/673;H01L21/677;H01L21/683 主分类号 H01L21/67
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