PLASMA DRY STRIP PRETREATMENT TO ENHANCE ION IMPLANTED RESIST REMOVAL

摘要

Systems and methods for processing a substrate include exposing a substrate to UV light from a UV light source having a predetermined wavelength range. The substrate includes a photoresist layer that has been bombarded with ions. The method includes controlling a temperature of the substrate, while exposing the substrate to the UV light, to a temperature less than or equal to a first temperature. The method includes removing the photoresist layer using plasma while maintaining a temperature of the substrate to less than or equal to a strip process temperature after exposing the substrate to the UV light.

主权项

1. A method for processing a substrate, comprising:
exposing a substrate to UV light from a UV light source having a predetermined wavelength range, wherein the substrate includes a photoresist layer that has been bombarded with ions; controlling a temperature of the substrate, while exposing the substrate to the UV light, to a temperature less than or equal to a first temperature; and after exposing the substrate to the UV light, removing the photoresist layer using plasma while maintaining a temperature of the substrate to less than or equal to a strip process temperature.