ION IRRADIATION METHOD AND FIXING DEVICE USED FOR ION IRRADIATION

摘要

PROBLEM TO BE SOLVED: To provide an ion irradiation technology capable of preventing the contact between a mask and a substrate surface.SOLUTION: An ion irradiation method includes a step (S12) for arranging a spacer member in an outer peripheral region of a semiconductor substrate having a first main surface; a step (S16) for fixing a mask arranged on the upper side of the main surface and the semiconductor substrate while sandwiching the spacer member therebetween; and a step (S18) for irradiating the semiconductor substrate with ions from the top of the mask. The step for fixing the mask and the semiconductor may include the step for mounting a clip which holds the mask and the semiconductor substrate and fixes them to each other.