VAPORIZER FOR PRECUSORS

摘要

The present disclosure relates to a precursor vaporizer for stably and uniformly vaporizing a large amount of precursors and supplying the vaporized precursors to a reaction chamber. According to one aspect of the present disclosure, the precursor vaporizer includes: a container having an inner space accommodating a source material; an exhaust port which discharges the source gas, generated in the inner space of the container, to the outside; a plurality of discharge guide plates which are arranged in the container, are stacked and arranged at predetermined intervals on a pathway through which the source gas is discharged to the exhaust port, and guide the source gas to pass the predetermined intervals and to be discharged; and a plate heater which heats the discharge guide plates at the same time.