| 发明名称 |
MASK ERROR COMPENSATION BY OPTICAL MODELING CALIBRATION |
| 摘要 |
Methodologies and an apparatus for enabling OPC models to account for errors in the mask are disclosed. Embodiments include: determining a patterning layer of a circuit design; estimating a penetration ratio indicating a mask corner rounding error of a fabricated mask for forming the patterning layer in a fabricated circuit; and determining, by a processor, a compensation metric for optical proximity correction of the circuit design based on the penetration ratio. |
| 申请公布号 |
US2015310157(A1) |
申请公布日期 |
2015.10.29 |
| 申请号 |
US201414263340 |
申请日期 |
2014.04.28 |
| 申请人 |
Globalfoundries Inc. |
发明人 |
NING Guoxiang;ACKMANN Paul;LIM Chin Teong |
| 分类号 |
G06F17/50 |
主分类号 |
G06F17/50 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A method comprising:
determining a patterning layer of a circuit design; estimating a penetration ratio indicating a mask corner rounding error of a fabricated mask for forming the patterning layer in a fabricated circuit; and determining, by a processor, a compensation metric for optical proximity correction of the circuit design based on the penetration ratio. |
| 地址 |
Grand Cayman KY |
