发明名称 |
MEMS Devices and Methods for Forming Same |
摘要 |
Embodiments of the present disclosure include MEMS devices and methods for forming MEMS devices. An embodiment is a method for forming a microelectromechanical system (MEMS) device, the method including forming a MEMS wafer having a first cavity, the first cavity having a first pressure, and bonding a carrier wafer to a first side of the MEMS wafer, the bonding forming a second cavity, the second cavity having a second pressure, the second pressure being greater than the first pressure. The method further includes bonding a cap wafer to a second side of the MEMS wafer, the second side being opposite the first side, the bonding forming a third cavity, the third cavity having a third pressure, the third pressure being greater than the first pressure and less than the second pressure. |
申请公布号 |
US2015307346(A1) |
申请公布日期 |
2015.10.29 |
申请号 |
US201514735652 |
申请日期 |
2015.06.10 |
申请人 |
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. |
发明人 |
Cheng Chun-Wen;Chu Chia-Hua |
分类号 |
B81B7/04 |
主分类号 |
B81B7/04 |
代理机构 |
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代理人 |
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主权项 |
1. A microelectromechanical systems (MEMS) device comprising:
a MEMS wafer comprising at least one MEMS structure; a first sealed cavity in the MEMS wafer, the first sealed cavity having a first pressure; a cap wafer bonded to a first side of the MEMS wafer; a second cavity between the MEMS wafer and the cap wafer, the second cavity having a second pressure, the second pressure being greater than the first pressure; a carrier wafer bonded to a second side of the MEMS wafer, the second side being opposite the first side; and a third cavity between the carrier wafer and the MEMS wafer, the third cavity having a third pressure, the third pressure being greater than the second pressure. |
地址 |
Hsin-Chu TW |