发明名称 MEMS Devices and Methods for Forming Same
摘要 Embodiments of the present disclosure include MEMS devices and methods for forming MEMS devices. An embodiment is a method for forming a microelectromechanical system (MEMS) device, the method including forming a MEMS wafer having a first cavity, the first cavity having a first pressure, and bonding a carrier wafer to a first side of the MEMS wafer, the bonding forming a second cavity, the second cavity having a second pressure, the second pressure being greater than the first pressure. The method further includes bonding a cap wafer to a second side of the MEMS wafer, the second side being opposite the first side, the bonding forming a third cavity, the third cavity having a third pressure, the third pressure being greater than the first pressure and less than the second pressure.
申请公布号 US2015307346(A1) 申请公布日期 2015.10.29
申请号 US201514735652 申请日期 2015.06.10
申请人 TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. 发明人 Cheng Chun-Wen;Chu Chia-Hua
分类号 B81B7/04 主分类号 B81B7/04
代理机构 代理人
主权项 1. A microelectromechanical systems (MEMS) device comprising: a MEMS wafer comprising at least one MEMS structure; a first sealed cavity in the MEMS wafer, the first sealed cavity having a first pressure; a cap wafer bonded to a first side of the MEMS wafer; a second cavity between the MEMS wafer and the cap wafer, the second cavity having a second pressure, the second pressure being greater than the first pressure; a carrier wafer bonded to a second side of the MEMS wafer, the second side being opposite the first side; and a third cavity between the carrier wafer and the MEMS wafer, the third cavity having a third pressure, the third pressure being greater than the second pressure.
地址 Hsin-Chu TW