发明名称 |
PROCESS FOR PRODUCING MAGNETORESISTIVE EFFECT ELEMENT |
摘要 |
This invention provides a production process in which in a process for producing a magnetoresistive effect element, noble metal atoms in a re-deposited film adhered to a side wall after element isolation are efficiently removed to prevent short-circuiting due to the re-deposited film.;The noble metal atoms are selectively removed from the re-deposited film by applying an ion beam, formed using a plasma of a Kr gas or a Xe gas, to the re-deposited film formed on the side wall of the magnetoresistive effect element after the element isolation. |
申请公布号 |
US2015311432(A1) |
申请公布日期 |
2015.10.29 |
申请号 |
US201314443566 |
申请日期 |
2013.11.11 |
申请人 |
CANON ANELVA CORPORATION |
发明人 |
NAKAGAWA Yukito;KODAIRA Yoshimitsu;KURITA Motozo;NAKAGAWA Takashi |
分类号 |
H01L43/12;H01L43/10;H01L43/02;H01L43/08 |
主分类号 |
H01L43/12 |
代理机构 |
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代理人 |
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主权项 |
1. A process for producing a magnetoresistive effect element having two ferromagnetic layers and a tunnel barrier layer located between the two ferromagnetic layers, the process comprising a step of applying an ion beam to a metal material adhered to the side wall of the tunnel barrier layer,
wherein the ion beam is formed using a plasma of a Kr gas or a Xe gas. |
地址 |
Kawasaki-shi, Kanagawa JP |