发明名称 PROCESS FOR PRODUCING MAGNETORESISTIVE EFFECT ELEMENT
摘要 This invention provides a production process in which in a process for producing a magnetoresistive effect element, noble metal atoms in a re-deposited film adhered to a side wall after element isolation are efficiently removed to prevent short-circuiting due to the re-deposited film.;The noble metal atoms are selectively removed from the re-deposited film by applying an ion beam, formed using a plasma of a Kr gas or a Xe gas, to the re-deposited film formed on the side wall of the magnetoresistive effect element after the element isolation.
申请公布号 US2015311432(A1) 申请公布日期 2015.10.29
申请号 US201314443566 申请日期 2013.11.11
申请人 CANON ANELVA CORPORATION 发明人 NAKAGAWA Yukito;KODAIRA Yoshimitsu;KURITA Motozo;NAKAGAWA Takashi
分类号 H01L43/12;H01L43/10;H01L43/02;H01L43/08 主分类号 H01L43/12
代理机构 代理人
主权项 1. A process for producing a magnetoresistive effect element having two ferromagnetic layers and a tunnel barrier layer located between the two ferromagnetic layers, the process comprising a step of applying an ion beam to a metal material adhered to the side wall of the tunnel barrier layer, wherein the ion beam is formed using a plasma of a Kr gas or a Xe gas.
地址 Kawasaki-shi, Kanagawa JP
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