LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
摘要
<p>Disclosed is a lithographic apparatus and associated method, the lithographic apparatus comprising an illumination system configured to condition a radiation beam which comprises both EUV radiation and non-EUV radiation. The lithographic apparatus is operable to obtain a measurement of the non-EUV radiation content comprised within said radiation beam; to model imaging effects which comprise the resultant effects of said non-EUV radiation on an image formed on a substrate by the lithographic apparatus as a result of a lithographic process; and to determine optimized illumination system settings which mitigate some or all of these imaging effects.</p>
