Mask and method of manufacturing the same

摘要

A method of manufacturing a mask includes: providing a base substrate including light-absorbing layer patterns on a first surface thereof; providing a reflective layer on the light-absorbing layer patterns and the first surface of the base substrate; and providing reflective patterns by partially removing the reflective layer. The providing the reflective patterns includes removing the light-absorbing layer patterns and a portion of the reflective layer, by irradiating the light-absorbing layer patterns with laser light.

主权项

1. A method of manufacturing a mask, the method comprising:
providing a base substrate comprising light-absorbing layer patterns on a first surface thereof, side surfaces of the light absorbing layer patterns exposing a portion of the first surface of the base substrate; providing a reflective layer overlapping the light-absorbing layer patterns and overlapping the exposed portion of the first surface of the base substrate, to dispose the light-absorbing patterns between the reflective layer and the first surface of the base substrate and to dispose the reflective layer overlapping the exposed portion of the first surface of the base substrate facing the side surfaces of the light-absorbing patterns exposing the portion of the first surface of the base substrate; and providing reflective patterns by partially removing the reflective layer, wherein the providing the reflective patterns comprises removing the light-absorbing layer patterns disposed between the reflective layer and the first surface of the base substrate and a portion of the reflective layer disposed overlapping the light-absorbing layer patterns disposed between the reflective layer and the first surface of the base substrate, by irradiating the light-absorbing layer patterns disposed between the reflective layer and the first surface of the base substrate through a second surface opposite to the first surface of the base substrate with laser light.