发明名称 Cleaning processing device for biological implant
摘要 Provided is a cleaning processing device that is for a biological implant and that is capable of quickly eliminating ozone generated by ultraviolet-ray radiation after completion of ultraviolet-ray radiation towards the biological implant. The cleaning processing device for a biological implant performs cleaning processing of the biological implant by means of radiating ultraviolet rays at the surface of the biological implant and by causing ozone to contact the surface of the biological implant, and the cleaning processing device is characterized by being provided with a housing, an ultraviolet-ray radiating lamp that is disposed within the housing and that radiates ultraviolet rays at the biological implant, an ozone-removing filter disposed within the housing, and a fan that introduces the ambient gas within the housing to the ozone-removing filter, and is further characterized by the fan being driven in response to the end of cleaning processing of the biological implant.
申请公布号 US9168570(B2) 申请公布日期 2015.10.27
申请号 US201113823397 申请日期 2011.09.05
申请人 USHIO DENKI KABUSHIKI KAISHA 发明人 Ogawa Yoshimasa
分类号 B08B7/00;A61L2/10;A61C8/00;A61C19/00 主分类号 B08B7/00
代理机构 Fitzpatrick, Cella, Harper & Scinto 代理人 Fitzpatrick, Cella, Harper & Scinto
主权项 1. A cleaning processing device for a biological implant intended to clean the biological implant by radiating ultraviolet rays to a surface of the biological implant and also causing ozone to come into contact with the surface thereof, the device comprising: a housing, the housing including: a processing chamber for cleaning the biological implant,an ozone-removing chamber disposed above the processing chamber, the ozone-removing chamber for removing the ozone from the processing chamber, anda partition wall for partitioning the processing chamber from the ozone-removing chamber, the partition wall being made of metal; a plurality of ultraviolet-ray radiating lamps facing each other, with the biological implant positioned therebetween, disposed in the processing chamber of the housing to radiate the ultraviolet rays to the biological implant; an ozone-removing filter portion disposed in the ozone-removing chamber; and a fan for introducing atmospheric gas present in the processing chamber into the ozone-removing filter portion, the fan being driven in response to a completion of a cleaning process for the biological implant, wherein heat caused by light from the ultraviolet-ray radiating lamps is transferred through the partition wall to the ozone-removing filter portion.
地址 Tokyo JP