发明名称 |
Method of optimizing a lithographic process, device manufacturing method, lithographic apparatus, computer program product and simulation apparatus |
摘要 |
A method of optimizing a lithographic process for imaging a pattern, including a plurality of features, onto a substrate using a lithographic apparatus, the lithographic apparatus having a controllable illumination system to illuminate a patterning device and a controllable projection system to project an image of the patterning device onto the substrate, the method including selecting a feature from the plurality of features, determining an illumination setting for the illumination system to optimize imaging of the selected feature, and determining a projection setting for the projection system to optimize imaging of the selected feature taking account of the illumination setting. |
申请公布号 |
US9170502(B2) |
申请公布日期 |
2015.10.27 |
申请号 |
US201113277830 |
申请日期 |
2011.10.20 |
申请人 |
ASML NETHERLANDS B.V. |
发明人 |
Finders Jozef Maria |
分类号 |
G03F7/20 |
主分类号 |
G03F7/20 |
代理机构 |
Pillsbury Winthrop Shaw Pittman LLP |
代理人 |
Pillsbury Winthrop Shaw Pittman LLP |
主权项 |
1. A method of optimizing a lithographic process for imaging a pattern comprising a plurality of features onto a substrate using a lithographic apparatus, the lithographic apparatus having a controllable illumination system arranged to illuminate a patterning device with radiation and a controllable projection system arranged to project an image of the patterning device onto the substrate as a patterned beam of radiation, the method comprising:
selecting a feature from the plurality of features; determining an illumination setting for the illumination system to optimize imaging of the selected feature; determining a projection setting for the projection system to optimize imaging of the selected feature taking account of the illumination setting; and verifying the effect of the illumination setting and the projection setting on the image of at least a part of the pattern, the at least part of the pattern including a feature not selected in the selecting step. |
地址 |
Veldhoven NL |