| 摘要 |
An electron beam lithography apparatus of an embodiment of the present invention comprises: an electric gun device for emitting an electron beam; a height adjusting unit which is arranged behind the electric gun device on an optical axis direction, and can adjust a height position of the electric gun device; an electric lens which is arranged behind the height adjusting unit on the optical axis direction, and converges the electron beam; a lens control unit for controlling the electric lens to make the electron beam form a cross over in a certain position at every height position by adjusting the variable height position of the electric gun device ; and an object lens which is arranged behind the electric lens on the optical axis direction, and forms an image on a sample using the electron beam passing through the electric lens. |
