| 摘要 |
PROBLEM TO BE SOLVED: To provide a charged particle beam lithography apparatus, an information processing apparatus, a pattern inspection device and a charged particle beam lithography method capable of enhancing the processing efficiency.SOLUTION: A charged particle beam lithography apparatus includes a graphic information file F1 for storing graphic information of each lower layer element (e.g., a pattern) corresponding to a specific layer element (e.g., a cell) in the graphic data of hierarchical structure having elements in each layer, and an attribute information file F2 for storing attribute information imparted to each lower layer element in association with information (e.g., an index number) related to a specific layer element. |
