| 发明名称 |
COMPOSITION FOR BASE, AND DIRECTED SELF-ASSEMBLY LITHOGRAPHY METHOD |
| 摘要 |
A composition for a base of a directed self-assembling film includes a compound including an oxo acid group, and a solvent. The compound is preferably represented by formula (1). A represents an organic group having 10 or more carbon atoms and having a valency of n. B represents an oxo acid group. n is an integer of 1 to 200. In a case where n is 2 or greater, a plurality of Bs are identical or different.;AB)n (1) |
| 申请公布号 |
US2015301445(A1) |
申请公布日期 |
2015.10.22 |
| 申请号 |
US201514691043 |
申请日期 |
2015.04.20 |
| 申请人 |
JSR CORPORATION |
发明人 |
Komatsu Hiroyuki;Naruoka Takehiko;Minegishi Shinya;Sakai Kaori;Nagai Tomoki |
| 分类号 |
G03F7/00;G02F1/1333;H01L21/311;C08L25/14;G03F7/16 |
主分类号 |
G03F7/00 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A composition for a base of a directed self-assembling, the composition comprising:
a compound comprising an oxo acid group; and a solvent. |
| 地址 |
Tokyo JP |
