发明名称 |
FLUORINE-CONTAINING CONDUCTIVE FILMS |
摘要 |
An atomic layer deposition (ALD) process for depositing a fluorine-containing thin film on a substrate can include a plurality of super-cycles. Each super-cycle may include a metal fluoride sub-cycle and a reducing sub-cycle. The metal fluoride sub-cycle may include contacting the substrate with a metal fluoride. The reducing sub-cycle may include alternately and sequentially contacting the substrate with a reducing agent and a nitrogen reactant. |
申请公布号 |
WO2015160499(A1) |
申请公布日期 |
2015.10.22 |
申请号 |
WO2015US23492 |
申请日期 |
2015.03.31 |
申请人 |
ASM IP HOLDING B.V. |
发明人 |
BLOMBERG, TOM, E.;LINDROOS, LINDA;HUOTARI, HANNU |
分类号 |
C23C16/08 |
主分类号 |
C23C16/08 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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