发明名称 WIRING SUBSTRATE AND METHOD FOR MANUFACTURING WIRING SUBSTRATE
摘要 A wiring substrate includes an insulating layer, and a connection terminal formed on the insulating layer. The connection terminal includes a metal layer formed on the insulating layer and including an upper surface, a metal post formed on the upper surface of the metal layer and including upper and side surfaces, and a surface plating layer that covers the upper and side surfaces of the metal post. The metal layer includes a material that is inactive with respect to a material included in the surface plating layer. The metal layer has an upper surface edge part that is exposed at an outside from the side surface of the metal post in a plan view. The surface plating layer is formed to expose the upper surface edge part of the metal layer.
申请公布号 US2015305153(A1) 申请公布日期 2015.10.22
申请号 US201514675819 申请日期 2015.04.01
申请人 SHINKO ELECTRIC INDUSTRIES CO., LTD. 发明人 IMAFUJI Kei;SHIMIZU Noriyoshi;OI Kiyoshi;ARISAKA Hiromu
分类号 H05K1/11;H05K1/02 主分类号 H05K1/11
代理机构 代理人
主权项 1. A wiring substrate comprising: an insulating layer; and a connection terminal formed on the insulating layer; wherein the connection terminal includes a metal layer formed on the insulating layer and including an upper surface,a metal post formed on the upper surface of the metal layer and including upper and side surfaces, anda surface plating layer that covers the upper and side surfaces of the metal post, wherein the metal layer includes a material that is inactive with respect to a material included in the surface plating layer, wherein the metal layer has an upper surface edge part that is exposed at an outside from the side surface of the metal post in a plan view, and wherein the surface plating layer is formed to expose the upper surface edge part of the metal layer.
地址 Nagano JP
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