发明名称 半導体装置の評価方法
摘要 <p>To provide a simple method for evaluating reliability of a transistor, a simple test which correlates with a bias-temperature stress test (BT test) is performed instead of the BT test. Specifically, a gate current value is measured in the state where a voltage lower than the threshold voltage of an n-channel transistor whose channel region includes an oxide semiconductor is applied between a gate and a source of the transistor and a potential applied to a drain is higher than a potential applied to the gate. The evaluation of the gate current value can be simply performed compared to the case where the BT test is performed; for example, it takes short time to measure the gate current value. That is, reliability of a semiconductor device including the transistor can be easily evaluated.</p>
申请公布号 JP5797449(B2) 申请公布日期 2015.10.21
申请号 JP20110103336 申请日期 2011.05.04
申请人 发明人
分类号 H01L21/336;H01L29/786 主分类号 H01L21/336
代理机构 代理人
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