发明名称 A INDUSTRIAL CLEANSING COMPOISITON COMPRISING SOPHOROLIPID
摘要 The present invention relates to an industrial cleansing solution composition comprising sophorolipid as an active ingredient. The cleansing solution composition of the present invention, as a low-toxicity and eco-friendly cleaning solution composition using a microorganism surfactant with excellent cleaning effects, can be broadly applied to removal of oil, other pollutants, flux, etc, in processes of manufacturing, processing, and postprocessing semiconductor and electronic circuit, metal, and polymer material fields, and particularly can be used for cleaning a semiconductor PCB substrate.
申请公布号 KR20150117350(A) 申请公布日期 2015.10.20
申请号 KR20140042481 申请日期 2014.04.09
申请人 INHA-INDUSTRY PARTNERSHIP INSTITUTE 发明人 KIM, EUN KI;AHN, CHANG HA
分类号 C11D3/386;C11D3/22 主分类号 C11D3/386
代理机构 代理人
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