| 摘要 |
An imaging optical system for microlithography is used to illuminate an object field. The illumination optical system has a first transmission optical system for guiding illumination light proceeding from a light source. An illumination presetting facet mirror with a plurality of illumination presetting facets is arranged downstream of the first transmission optical system. The illumination presetting facet mirror produces a preset illumination of the object field via an edge shape, which can be illuminated, of the illumination presetting facet mirror and individual tilting angles of the illumination presetting facets. An arrangement of the first transmission optical system and the illumination presetting facet mirror is such that telecentric illumination of the object field results. An optical system according to a further aspect has, between the illumination presetting facet mirror and the object field, an entry pupil plane of a projection optical system, which, together with the illumination optical system, belongs to an optical system for microlithography. In this aspect, the first transmission optical system and the illumination presetting facet mirror are arranged to illuminate the object field adapted to the entry pupil of the projection optical system. In further aspects within an optical system with a projection optical system and an illumination optical system, a large object-image offset or a large intermediate focus-image offset is present in relation to an installation length of the projection optical system. Illumination optical systems and optical systems which satisfy particular efficiency demands with regard to the use of the illumination light result. |
