用来涂布基板之方法及涂布机;METHOD FOR COATING A SUBSTRATE AND COATER

摘要

兹提供以一阴极组件(10)来涂布一基板(100)的方法，该阴极组件具有一可旋转靶材(20)。该可旋转靶材内设有至少一磁铁组件(25)。该方法包括在预定第一时间间隔，把磁铁组件放到第一位置上，使其不对称对准一平面(22)，平面(22)是从基板(100)垂直延伸到该可旋转靶材的轴线(21)；在预定第二时间间隔，把磁铁组件放到第二位置，其不对称对准平面(22)；以及提供电压至可旋转靶材，其在涂布期间会随时间变化。另外，兹提供涂布机，其包括一具可旋转曲面靶材之阴极组件；以及设于可旋转曲面靶材内的两个磁铁组件，其中该两个磁铁组件间的距离是可变的。; positioning the magnet assembly at a second position that is asymmetrically aligned with respect to said plane (22) for a predetermined second time interval; and providing a voltage to the rotatable target that is varied over time during coating. Further, a coater is provided that includes a cathode assembly with a rotatable curved target; and two magnet assemblies positioned within the rotatable curved target wherein the distance between the two magnet assemblies can be varied.